Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片
织构上而不影响分子取向矢的分布,因而可以用化学刻蚀和
镜技术揭示其向错和取向矢图。
Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片织构上而不影响分子取向矢的分布,因而可以用化学刻蚀和镜技术揭示其向错和取向矢图。
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